E-Beam Lithography Conversion Kit
E-Beam Lithography Conversion Kit. Raith nanolithography system capable of writing sub 100nm dimensions with up to 16bit resolution. Local ID: PH/02287
| Facility: | Nanomaterials Rapid Prototyping Facility |
| Part of: | School of Physics & Astronomy Physical Sciences and Engineering |
| Location: | Physics |
Contact
LEBLANC, KATHLEEN
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